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Related knowledge of titanium nitride ceramics

wallpapers Technology 2021-03-29
Titanium Nitride (TiN) ceramics have high hardness and good chemical stability. They can be used as refractory and wear-resistant materials; they have the characteristics of golden yellow luster and can be used for surface decoration to improve wear resistance. They are especially suitable for daily-use artistic ceramics. Surface decoration.
 
Manufacturing of Titanium Nitride Ceramics
1. Preparation of titanium nitride (TiN) powder: the methods of preparing titanium nitride powder include titanium hydride, titanium powder direct helium method; TiO2 carbonization reduction, and chemical vapor deposition (CVD method), etc., as shown in Table 3-23 Show.
2. The manufacturing method of titanium nitride ceramics is similar to that of boron nitride ceramics.
3. Golden titanium nitride coating: CVD method is often used to deposit titanium nitride coating on the surface of ceramics on daily ceramics and artistic ceramics, which not only has abrasion resistance but also has a decorative effect of golden luster. As a result, expensive gold can be replaced and saved.
 
The properties of titanium nitride ceramics
Titanium nitride ceramics have golden yellow luster, high hardness (microhardness of 21GPa), high melting point (2950°C), good chemical stability, and high electrical conductivity and superconductivity.
 
Uses of titanium nitride ceramics
Titanium nitride (TiN) ceramics have the characteristics of high hardness and good chemical stability, which can be used as refractory and wear-resistant materials; the use of titanium nitride ceramics has the characteristics of golden yellow luster and can be used for surface decoration to improve wear resistance. It is especially suitable for the surface decoration of daily-use artistic ceramics. Titanium nitride ceramics have high electrical conductivity and superconductivity and can be used as materials for molten salt electrolysis and electrical contacts.
 
Chemical vapor deposition
The chemical vapor deposition method (CVD method) uses nitrogen as the source of nitrogen, and its reaction formula is as follows:
800℃-850℃
2TiCl4+N2+H2—→2TiN + 8HCl
When ammonia (NH3) is used as the source of nitrogen, the reaction formula is as follows:
700℃ ~ 800℃
TiCl4+ NH3+ 1/2H2—→TiN + 4HCl
Practice shows that in the above two reactions, the deposition temperature of the former is higher than that of the latter. The former is 800°C to 850°C because the free enthalpy of the reaction of the former is higher than that of the latter. The TiN coating obtained is reddish-golden, while the former reaction is golden yellow. This is because the nitrogen content in TiN obtained from the latter formula is higher than that of the former. Therefore, from the perspective of the color effect of the deposited coating, the effect of the latter reaction is better.
The color and firmness of the deposited TiN are closely related to the flow rate and temperature of TiCl and N2, but as long as the deposition temperature is controlled between 800°C and 850°C, the gas flow rate should be as small as possible, and the substrate surface treatment can be appropriate. A golden TiN coating is obtained on the ceramic surface.

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